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Conferences > JSAP > 2019 > PDPICSP > 20a_E215_6
  • JSAP-OSA Joint Symposia 2019 Abstracts
  • OSA Technical Digest (Optica Publishing Group, 2019),
  • paper 20a_E215_6

Fabrication of Si Photonics Waveguides by Thick Resist-Mask Electron Beam Lithography Proximity Effect Correction

Moataz Eissa, Takuya Mitarai, Tomohiro Amemiya, Nobuhiko Nishiyama, and Yasuyuki Miyamoto

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Abstract

Silicon photonics has been an active research field in the last decade due to the potential of optoelectronics integration [1]. Silicon photonics devices can be integrated within a CMOS compatible process to yield high performance Si chips that offer optical functionalities with reduced cost. Hence, it can be a promising candidate to exceed the speed bottleneck for data interconnects.

© 2019 Japan Society of Applied Physics, The Optical Society (OSA)

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