Abstract
Reducing light reflection from the surface of photo-voltaic cells made of silicon nitride films deposited on the textured single or multi crystalline Si plays a key role to improve the cell efficiency. Recently, chemical dry etching using ClF3 have been intensively studied to texture single and/or multi crystalline Si [1, 2]. In order to reduce the process cost and the process chamber corrosion induced by Cl, we have been investigating the nanoscale Si surface texturing using etch species generated by the reaction of F2 + NOx (X=1, 2) F + FNOx [3, 4]. In this study, we eval-uated the change in optical properties of various Si com-pounds by modulating the NO/F2 ratio that would modify the nanoscale surface texturing by controlling the adsorption of F2, NOx, F, and FNOx on the Si surface. The chemi-cal bonding structures, responsible to pattern the Si surface, were predicted by the density functional theory (DFT) using CAM B3LYP 6-311 G+(d,p) in Gaussian 09.
© 2015 Japan Society of Applied Physics, Optical Society of America
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