Abstract

Over the past few decades, there has been increasing attention on metal nanofabrication due to its promising property of electrics, thermology and optics. At the same time, the increasing demand for powerful integrated circuits and other applications have spurred remarkable progress in metal nanofabrication. In order to realize the two-dimensional (2D) or 3D metal structure fabrication and improve the structures function and morphology, various nanofabrication methods have been proposed. For example, UV excimer laser annealing,^[1] UV roll imprint lithography,^[2] scanning probe lithography^[3] and E-beam lithography.^[4] But those nanofabrication methods either need very complicated pre-process, or the cast is too expensive to afford. As a direct write technique, multiphoton absorption nanofabrication has great potential in metal nanofabrication.

© 2015 Japan Society of Applied Physics, Optical Society of America