Abstract
We demonstrate how the nonlinear relationship between the fluorescence emission rate and the illumination intensity can be combined with the pattern-illuminated Fourier ptychography to further enhance the resolution. This method, termed saturated pattern-illuminated Fourier ptychography Microscopy, utilizes the saturation property of the fluorophore to acquire the high frequency information of the fluorescent samples. Simulations have been conducted to demonstrate its effectiveness and more detailed simulations and experimental tests will be done in the future.
© 2016 Optical Society of America
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