Spatial Light Modulators in Laser Lithography Systems

Achim Jehle; Steffen Diez

doi:10.1364/ISA.2016.IM4F.2

Imaging and Applied Optics 2016
(Optica Publishing Group, 2016),
paper IM4F.2
•https://doi.org/10.1364/ISA.2016.IM4F.2

Spatial Light Modulators in Laser Lithography Systems

Achim Jehle and Steffen Diez

Imaging Systems and Applications 2016

Heidelberg Germany
25–28 July 2016
ISBN: 978-1-943580-15-6

From the session
Super-resolution Lithography (IM4F)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
A. Jehle and S. Diez, "Spatial Light Modulators in Laser Lithography Systems," in Imaging and Applied Optics 2016, (Optica Publishing Group, 2016), paper IM4F.2.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Abstract

Using Spatial Light Modulators in combination with high power lasers opens new possibilities in laser lithography. This work shows the benefit of using such devices and the challenges of integrating optical engines into these systems.

PDF Article

More Like This

Adjustment and Application of Spatial Light Modulators for Holography

Malte Hasler, Tobias Haist, and Wolfgang Osten
DW1D.1 Digital Holography and Three-Dimensional Imaging (DH) 2016

Spatial Frequency Modulated Imaging (SPIFI) in Amplitude with a Spatial Light Modulator

Michael D. Young, Jeffrey J. Field, Randy A. Bartels, and Jeff Squier
JTh2A.57 Frontiers in Optics (FiO) 2016

Spatial Light Modulator-Based Maskless Holographic Lithography on Nonplanar Surfaces

David Fischer and Stefan Sinzinger
HTh3H.6 Digital Holography and Three-Dimensional Imaging (DH) 2020

Previous Article Next Article