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Optica Publishing Group
  • Conference on Lasers and Electro-Optics/International Quantum Electronics Conference
  • OSA Technical Digest (CD) (Optica Publishing Group, 2009),
  • paper JFA5
  • https://doi.org/10.1364/CLEO.2009.JFA5

13.2 nm Table-Top Inspection Microscope for Extreme Ultraviolet Lithography Mask Defect Characterization

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Abstract

We report on a reflection microscope that operates at 13.2 -nm wavelength with a spatial resolution of 55±3 nm. The microscope uses a table-top EUV laser to acquire images of photolithography masks in 20 seconds.

© 2009 Optical Society of America

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