Abstract
It has been demonstrated that permanent distributed Bragg gratings can be written in the core of an optical fibre by the ultraviolet (uv) irradiation [1]. The refractive index change (Δn) induced in the core was estimated as 10−4 for an as-drawn fibre [2]. The Δn could be increased to 10−3 by the treatment of the fibre in a high pressure hydrogen atmosphere [3]. In this paper, we report the uv-induced Δn of −1 % in sputter deposited GeO2-SiO2 thin glass films, and the preparation of Bragg gratings in the film by irradiation with excimer laser light through a phase mask, Glass films were deposited on the polished Si wafers using a conventional rf-sputtering method. Relative atomic concentrations of Ge and Si were estimate by X-ray photoelectron spectroscopy. ArF excimer laser pulses of 193 nm in wavelength, 30 mJ/cm2 in power density and 20 nsec of pulse duration were irradiated to the films at room temperature. The refractive indices of the films were measured by an ellipsometer using an He-Ne laser as a light source.
© 1996 Optical Society of America
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