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Optica Publishing Group
  • International Conference on Quantum Electronics
  • OSA Technical Digest (Optica Publishing Group, 1988),
  • paper TuP51

FABRICATION OF SILICON OXYNITRIDE AND SILICON NITRIDE WAVEGUIDES BY LASER CHEMICAL VAPOR DEPOSITION

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Abstract

Laser chemical vapor deposition (CVD) is a new thin film technology with such unique capabilities as low temperature and selective area deposition.1) Its potential applications are enormous, but so far the technique has been applied mainly to the semiconductor technologies.

© 1988 Optical Society of America

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