Abstract
High-crystallinity, direct-band-gap Ge0.89Sn0.11 is achieved at <450°C on amorphous dielectric layers and flexible substrates. The geometrically confined growth of pseudo-single-crystal Ge0.89Sn0.11 enables monolithic, large-scale 3D Si photonics.
© 2015 Optical Society of America
PDF Article | Presentation VideoMore Like This
Jifeng Liu, Haofeng Li, and Xiaoxin Wang
25J3_1 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 2015
Jifeng Liu and Xiaoxin Wang
STh4I.1 CLEO: Science and Innovations (CLEO:S&I) 2018
R. Geiger, S. Wirths, D. Buca, H. Sigg, N. von den Driesch, Z. Ikonic, J.M. Hartmann, J. Faist, S. Mantl, and D. Grützmacher
SM3G.5 CLEO: Science and Innovations (CLEO:S&I) 2015