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Conferences > IPR > 2002 > IFH > IFH4

Large-scale production techniques for photonic nanostructures using excimer laser replication

Wim Bogaerts, Dirk Taillaert, Roel Baets, Vincent Wiaux, and Stephen Beckx

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Abstract

We demonstrate wavelength-scale photonic structures for photonic integrated circuits fabricated with 248nm-excimer laser deep UV lithography. Deep UV lithography combines mass- manufacturing capability with the resolution needed for photonic crystals or other submicron photonic structures.

© 2002 Optical Society of America

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