Abstract
In recent years polymers have drawn increasing attention for their potential as cost effective waveguide material for integrated optic devices [1]. Standard fabrication processes for waveguide definition comprise reactive ion etching (RIE) of the waveguide structure [2], photo-locking of polymers doped with photoinitiators [3] and wet chemical etching of the unexposed polymer film of photosensitive polymers [4]. The drawback of the last two mentioned technologies lies in the necessity of adding photoinitiators respectively photo-crosslinking agents to the polymer solution which in general adversely influence the absorption characteristics of the polymer and limit the resolution of definable structures, whereas RIE may lead to a considerable surface roughness responsible for scattering losses.
© 1995 Optical Society of America
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