Abstract
A very significant application of the Vertical Cavity Surface-Emitting Laser (VCSEL)[1] [2] [3] [4] will be in the area of wide-band opto-electronic interconnect of electronic processors. To realize this goal the VCSEL should be considered as an addition to an electronic technology base and therefore compatible in growth and fabrication with viable logic circuits. Further, a planar structure is essential for performing the photolithographic processes to form the fine circuits as required for the gates of high speed transistors, with gate dimensions less than 1μm. The processing compatibility results in the simplest technology approach and thus realizes the highest circuit yield.
© 1993 Optical Society of America
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