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Conferences > IODC > 2002 > JWA > JWA2

Fabrication of Micro-Optical Systems with Deep X-Ray Lithography

W. C. Sweatt and T. R. Christenson

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Abstract

Preassembled, prealigned microlens systems have been fabricated in PMMA using Deep X-ray Lithography (DXRL)1. These systems consist of crossed cylindrical lenses with ≈0.3-mm apertures. Lithographically defined masks and two exposures from a synchrotron beam can produce arrays of micro- imagers, micro-spectrometers, etc.

© 2002 Optical Society of America

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