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Conferences > FiO > 2017 > FW6C > FW6C.4

Single-Process Fabrication Technique for Multi-Level Photonic Structures

Mutasem Odeh and Marcus S. Dahlem

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Abstract

We propose an alignment-free fabrication process to realize two-level photonic structures using a bilayer resist. The high contrast of the resist is preserved, and the technique can therefore be used in integrated nanophotonics.

© 2017 Optical Society of America

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