Abstract
The Pattern-Integrated Interference Lithography (PIIL) exposure system is analyzed. Experimental results of custom-modified interference patterns show good agreement with simulations, thus validating the modeling and fabrication methods employed.
© 2017 Optical Society of America
PDF ArticleMore Like This
Thomas K. Gaylord and Matthieu C. R. Leibovici
FTh2F.1 Frontiers in Optics (FiO) 2013
Matthieu C. R. Leibovici and Thomas K. Gaylord
FW1A.4 Frontiers in Optics (FiO) 2014
Guy M. Burrow, Matthieu C. R. Leibovici, and Thomas K. Gaylord
FW1F.4 Frontiers in Optics (FiO) 2012