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Rapid Single-Exposure Fabrication of 2D and 3D Custom-Modified Interference Patterns by Pattern-Integrated Interference Lithography

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Abstract

The Pattern-Integrated Interference Lithography (PIIL) exposure system is analyzed. Experimental results of custom-modified interference patterns show good agreement with simulations, thus validating the modeling and fabrication methods employed.

© 2017 Optical Society of America

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