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Conferences > FiO > 2016 > FTu2I > FTu2I.5

Maskless photolithography using a photon sieve on an optical fiber tip

Raquel Flores, Ricardo Janeiro, Dionísio Pereira, and Jaime Viegas

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Abstract

A photon sieve inscribed on a single mode optical fiber tip by focused ion beam milling is demonstrated for maskless lithography of a photoresist with a 405 nm wavelength laser.

© 2016 Optical Society of America

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