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Conferences > FiO > 2013 > FTh3F > FTh3F.2

Characterization of Multiple-Optical-Axis Implementation of Pattern-Integrated Interference Lithography

Donald E. Sedivy and Thomas K. Gaylord

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Abstract

The image quality and collimation in a multiple-optical-axis Pattern-Integrated Interference Lithography (PIIL) system are evaluated for a prototype system. Image quality and collimation are individually and jointly optimized for this configuration.

© 2013 Optical Society of America

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