Pattern-Integrated Interference Lithography Demonstration

Guy M. Burrow; Matthieu C. R. Leibovici; Thomas K. Gaylord

doi:10.1364/FIO.2012.FW1F.4

Frontiers in Optics 2012/Laser Science XXVIII
OSA Technical Digest (online) (Optica Publishing Group, 2012),
paper FW1F.4
•https://doi.org/10.1364/FIO.2012.FW1F.4

Pattern-Integrated Interference Lithography Demonstration

Guy M. Burrow, Matthieu C. R. Leibovici, and Thomas K. Gaylord

Frontiers in Optics 2012

Rochester, New York United States
14–18 October 2012
ISBN: 978-1-55752-956-5

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Three-Dimensional Optical Structure Fabrication (FW1F)

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G. M. Burrow, M. C. R. Leibovici, and T. K. Gaylord, "Pattern-Integrated Interference Lithography Demonstration," in Frontiers in Optics 2012/Laser Science XXVIII, OSA Technical Digest (online) (Optica Publishing Group, 2012), paper FW1F.4.

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Abstract

Pattern-integrated interference lithography (PIIL), a new method integrating superposed pattern imaging with interference lithography, is presented. A prototype implementation is used to demonstrate PIIL potential through the single-exposure fabrication of representative photonic crystal structures.

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