Interference Projection Exposure System

Guy M. Burrow; Thomas K. Gaylord

doi:10.1364/FIO.2011.FWZ2

Frontiers in Optics 2011/Laser Science XXVII
OSA Technical Digest (Optica Publishing Group, 2011),
paper FWZ2
•https://doi.org/10.1364/FIO.2011.FWZ2

Interference Projection Exposure System

Guy M. Burrow and Thomas K. Gaylord

Frontiers in Optics 2011

San Jose, California United States
16–20 October 2011
ISBN: 978-1-55752-917-6

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General Optical Design and Instrumentation II (FWZ)

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G. M. Burrow and T. K. Gaylord, "Interference Projection Exposure System," in Frontiers in Optics 2011/Laser Science XXVII, OSA Technical Digest (Optica Publishing Group, 2011), paper FWZ2.

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Abstract

An interference projection exposure system is presented for single-exposure fabrication of low-spatial-frequency functional elements in a high-spatial-frequency, all-surrounding periodic pattern. Photonic crystal devices are demonstrated.

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