Abstract
Here, we report on a method that resolves nanoscale patterns by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities. Optically saturating such transitions enable patterning of features below the Abbé diffraction limit. We call this novel method Patterning via Optical Saturable Transformations (POST). In addition to its high resolution, POST has the potential for high throughput and low overall cost.
© 2011 Optical Society of America
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