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Gray Scale E-beam Lithography to Fabricate 3D Micro-sized Waveguide and Grating Coupler in SU-8

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Abstract

Gray scale electron beam lithography is applied to prototype 3D waveguides and grating output couplers in SU-8 with simple and accurate method. The lag effect in reactive ion etching of Silicon-on-insulator gratings is avoided here.

© 2010 Optical Society of America

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