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Conferences > FiO > 2010 > FWS > FWS3

Constrained Parametric Optimization of Point Geometries in Multi-Beam-Interference Lithography

Guy M. Burrow and Thomas K. Gaylord

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Abstract

Multi-beam-interference lithography parameters are systematically analyzed and optimized. High absolute contrast and a variety of point geometries ranging from elliptical to rectilinear or rhombic intensity profiles are demonstrated.

© 2010 Optical Society of America

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