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  • Frontiers in Optics 2009/Laser Science XXV/Fall 2009 OSA Optics & Photonics Technical Digest
  • OSA Technical Digest (CD) (Optica Publishing Group, 2009),
  • paper JWC4
  • https://doi.org/10.1364/FIO.2009.JWC4

Pattern Transfer by Diffractive Photomask

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Abstract

A a phase-shift lithographic photomask for operation in proximity printing mode is fabricated based on a Fresnel computer-generated hologram. The results show a improvement of the achieved resolution as good as 1 µm.

© 2009 Optical Society of America

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