Add to BibSonomyAbstract
Nanometer focusing of nanometer wavelength x-rays produced by next-generation accelerator sources will require extraordinary control of wavefront errors introduced by reflective and refractive optics. Achieving this goal will require significant advances in metrology techniques.
© 2008 Optical Society of America
PDF ArticleMore Like This
Synchrotron Radiation and X-ray Mirror Metrology with the Long Trace Profiler
Peter Z. Takacs, Shinan Qian, and Haizhang Li
T8 Fabrication and Testing of Aspheres (FTA) 1999
At-wavelength metrology of X-ray adaptive mirrors at Diamond Light Source
Hongchang Wang, Yogesh Kashyap, John Sutter, and Kawal Sawhney
AOTh2C.2 Adaptive Optics: Analysis, Methods & Systems (AO) 2015
EUV/X-ray Multilayer Optics: Meeting the Challenges of Next-Generation Applications
Regina Soufli, Jeff Robinson, Eberhard Spiller, Monica Fernández-Perea, and Eric Gullikson
AM1K.3 CLEO: Applications and Technology (CLEO:A&T) 2016