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Patterning of Substrates Using Surface Relief Structures on Azobenzene Functionalized Polymers

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Abstract

The facile, all optical, single-step fabrication of surface relief structures (SRS) on azobenzene functionalized polymers has been investigated extensively due to the their potential use in a wide range of applications such as holographic image storage, polarization discrimination, waveguide couplers and fabrication of phase masks & intricate surface structures (1). The photo-induced reversible trans-cis-trans isomerization of the azobenzene groups in the polymer causes the formation of SRS at a temperature substantially below the glass transition temperature. This photo-fabrication technique has been used for inscription of intricate patterns (micron to sub micron features) on polymeric films. The use of such SRS for mask-free patterning of surfaces is presented.

© 2003 Optical Society of America

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