Nanoporous "Black Silicon" by a Nanocatalyzed Etch: Photovoltaic Anti-Reflection and Simple Physics from a Graded-Density Surface Layer

Howard M. Branz; Hao-Chih Yuan; Vernon E. Yost; Paul Stradins; Matthew R. Page

doi:10.1364/ENERGY.2009.WD3

Optics and Photonics for Advanced Energy Technology
OSA Technical Digest (CD) (Optica Publishing Group, 2009),
paper WD3
•https://doi.org/10.1364/ENERGY.2009.WD3

Nanoporous "Black Silicon" by a Nanocatalyzed Etch: Photovoltaic Anti-Reflection and Simple Physics from a Graded-Density Surface Layer

Howard M. Branz, Hao-Chih Yuan, Vernon E. Yost, Paul Stradins, and Matthew R. Page

Optics and Photonics for Advanced Energy Technology 2009

Cambridge, Massachusetts United States
24–25 June 2009
ISBN: 978-1-55752-875-9

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Solar I (WD)

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H. M. Branz, H. Yuan, V. E. Yost, P. Stradins, and M. R. Page, "Nanoporous "Black Silicon" by a Nanocatalyzed Etch: Photovoltaic Anti-Reflection and Simple Physics from a Graded-Density Surface Layer," in Optics and Photonics for Advanced Energy Technology, OSA Technical Digest (CD) (Optica Publishing Group, 2009), paper WD3.

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Abstract

We fabricate nanoporous "black-silicon" surfaces by a low-cost nanocatalyzed liquid etch and find an exponential decay of reflectance versus the wavelength-scaled density grade depth. Using this surface in place of conventional anti-reflection coating, we have fabricated confirmed 16.8%-efficient silicon solar cells. Article not available.

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