Fundamental Research Activities of EUV Lithography at NewSUBARU Synchrotron Light Facility

Takeo Watanabe; Tetsuo Harada

doi:10.1364/EUVXRAY.2020.ETu1A.5

OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS)
OSA Technical Digest (Optica Publishing Group, 2020),
paper ETu1A.5
•https://doi.org/10.1364/EUVXRAY.2020.ETu1A.5

Fundamental Research Activities of EUV Lithography at NewSUBARU Synchrotron Light Facility

Takeo Watanabe and Tetsuo Harada

Compact EUV & X-ray Light Sources 2020

Washington, DC United States
16–20 November 2020
ISBN: 978-1-943580-73-6

From the session
Compact Sources, Applications, and Enabling Technologies I (ETu1A)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
T. Watanabe and T. Harada, "Fundamental Research Activities of EUV Lithography at NewSUBARU Synchrotron Light Facility," in OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), L. Assoufid, P. Naulleau, M. Couprie, T. Ishikawa, J. Rocca, C. Haefner, G. Sansone, T. Metzger, F. Quéré, M. Ebrahim-Zadeh, A. Helmy, F. Laurell, and G. Leo, eds., OSA Technical Digest (Optica Publishing Group, 2020), paper ETu1A.5.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Get Video
Citation alert
Save article

Abstract

The recent EUVL activities of resists, masks, and optics at NewSUBARU Synchrotron Light Facility are introduced. In addition, the capabilities of the shortening the wavelength to 6.75 nm with high-power EUV source are also discussed.

PDF Article | Presentation Video

More Like This

R&D Activities of EUV Lithography at NewSUBARU, and Possibility of Beyond EUV

Takeo Watanabe, Tetsuo Harada, and Shinji Yamakawa
EW6A.6 Compact EUV & X-ray Light Sources (EUVXRAY) 2022

Multilayer Facilities for EUV Lithography

D. L. Windt and W. K. Waskiewicz
EC.47 Extreme Ultraviolet Lithography (EUL) 1994

Laser Produced Plasma Light Sources for EUV Lithography

Bruno La Fontaine
AFA4 Conference on Lasers and Electro-Optics: Applications (CLEO:A&T) 2010

Previous Article Next Article

Presentation Video

Presentation video access is available to:

Optica Publishing Group subscribers
Technical meeting attendees
Optica members who wish to use one of their free downloads. Please download the article first. After downloading, please refresh this page.

Contact your librarian or system administrator
or
Log in to access Optica Member Subscription or free downloads