Circularly-Polarized Harmonic Generation in Underdense Plasma Using Bi-Color Lasers

Zahra M. Chitgar; Paul Gibbon

doi:10.1364/EUVXRAY.2020.ETh3A.3

OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS)
OSA Technical Digest (Optica Publishing Group, 2020),
paper ETh3A.3
•https://doi.org/10.1364/EUVXRAY.2020.ETh3A.3

Circularly-Polarized Harmonic Generation in Underdense Plasma Using Bi-Color Lasers

Zahra M. Chitgar and Paul Gibbon

Compact EUV & X-ray Light Sources 2020

Washington, DC United States
16–20 November 2020
ISBN: 978-1-943580-73-6

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Compact Sources, Applications, and Enabling Technologies II (ETh3A)

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Z. M. Chitgar and P. Gibbon, "Circularly-Polarized Harmonic Generation in Underdense Plasma Using Bi-Color Lasers," in OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), L. Assoufid, P. Naulleau, M. Couprie, T. Ishikawa, J. Rocca, C. Haefner, G. Sansone, T. Metzger, F. Quéré, M. Ebrahim-Zadeh, A. Helmy, F. Laurell, and G. Leo, eds., OSA Technical Digest (Optica Publishing Group, 2020), paper ETh3A.3.

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Abstract

We have modeled bi-color circularly polarized harmonic generation in under-dense plasmas using a combination of PIC simulation and a nonlinear fluid model. Generalized selection rules and helicities, together with harmonic efficiencies are predicted and found to be consistent with numerical results.

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