Abstract
Surface nano- and microstructuring with additive and subtractive lithography techniques are commonly used in nanotechnology and photonics, while nanoimprint lithography and nanosphere lithography are used for creating periodic structures for plasmonics applications. Single step, maskless optical patterning techniques also exist, notably multi-beam interference based techniques and Laser Induced Periodic Surface Structures (LIPSS). LIPSS have been demonstrated on metals, semiconductors, dielectric surfaces, polymers, and have been used in various applications including solar cells, plasmonics, colorizing metals, wettability and tribology applications. Until recently these optical techniques lacked the long-range periodicity required for some of the applications. Moreover, conventional optical lithography techniques require complex masks, while e-beam lithography and ion-beam lithography require expensive equipment. Recently, a method for direct writing of highly-regular LIPSS (HR-LIPSS) was developed for creating uniform approach overcoming all aforementioned lithography problems [1].
© 2017 IEEE
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