Abstract
An innovative fabrication technique is introduced that is based on multiple exposure techniques for micro-optics fabrication. This method utilizes varying exposure times and masks to combine binary and analog photo-masks to sculpt complex photoresist profiles.
© 2002 Optical Society of America
PDF ArticleMore Like This
W. C. Sweatt and T. R. Christenson
JWA2 Diffractive Optics and Micro-Optics (DOMO) 2002
Mikael Karlsson and Fredrik Nikolajeff
DMB2 Diffractive Optics and Micro-Optics (DOMO) 2002
Markus Rossi and Ilkka Kallioniemi
DTuC1 Diffractive Optics and Micro-Optics (DOMO) 2002