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Fabrication of micro conical array for antireflection structured surface using a metal dot pattern

H. Toyota, K. Takahara, M. Okano, T. Yotsuya, and H. Kikuta

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Abstract

We have fabricated two-dimensional antireflection structured (ARS) surfaces on a planar fused silica substrate. The ARS surfaces were formed by means of electron beam writing machine. Lift off process of a resist after chrome deposition and reactive ion etching due to fluorocarbon plasma were adopted. The surfaces had a conical profile, whose size was 250 nm of grating period and 750 nm of groove depth. Measured reflectivity was less than 0.6 % for vertical incident light in the range of 400-800-nm wavelengths.

© 2000 Optical Society of America

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