Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Refractive micolens arrays for photolithography

Not Accessible

Your library or personal account may give you access

Abstract

We report on the fabrication of high-quality microlens arrays (refractive, plano-convex) on 8″-fused silica wafers. The lens arrays are used for Microlens Projection Lithography and within UV-light illumination systems. Microlens Projection Lithography is an innovative technique using KARL SUSS Mask Aligners equipped with an ultra-flat microlens-based array-imaging system. Microlens Projection Lithography provides an increased depth of focus (> 50 um) at a larger working distance (> 1 mm) than standard proximity printing. Microlens Projection Lithography allows photolithography on curved or non-planar substrates, in V-grooves, holes, etc. using a KARL SUSS Mask Aligner.

© 2000 Optical Society of America

PDF Article
More Like This
Microlens Lithography

R. Völkel, H. P. Herzig, Ph. Nussbaum, W. Singer, and R. Dändliker
DWB.4 Diffractive Optics and Micro-Optics (DOMO) 1996

Coatings for Photolithography

Arno K. Hagenlocher
TuD1 Optical Interference Coatings (OIC) 1984

Photoresist Polymeric Materials for 157nm Photolithography

E. Sarantopoulou, A. C. Cefalas, E. Gogolides, and P. Argitis
CTuO2 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2000

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved