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Conferences > COSI > 2015 > JW2A > JW2A.3

Super-Resolution Optical Lithography via Barrier-Free Absorbance Modulation and Separable Substrate Technique

Apratim Majumder, Farhana Masid, Benjamin Pollock, Trisha L. Andrew, and Rajesh Menon

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Abstract

This paper reports two new techniques of performing the sub-wavelength lithographic process - Absorbance Modulation Optical Lithography (AMOL) without barrier layers and using separable substrates and its most recent developments and characterization.

© 2015 Optical Society of America

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More Like This
Super-resolution Optical Nanolithography: Beyond the far-field diffraction limit

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