Mid-infrared Absorption of Femtosecond Laser Microstructured Silicon Formed in Different Gas Ambient

Sun Haibin; Sun Haibin; Sun Shengli; Sun Shengli; Chen Fuchu; Zhao li; Wang Guifu; Wang Guifu

doi:10.1364/CLEO_AT.2020.JW2B.14

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2020),
paper JW2B.14
•https://doi.org/10.1364/CLEO_AT.2020.JW2B.14

Mid-infrared Absorption of Femtosecond Laser Microstructured Silicon Formed in Different Gas Ambient

Sun Haibin, Sun Shengli, Chen Fuchu, Zhao li, and Wang Guifu

CLEO: Science and Innovations 2020

Washington, DC United States
10–15 May 2020
ISBN: 978-1-943580-76-7

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Joint Poster Session 8 (JW2B)

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S. Haibin, S. Shengli, C. Fuchu, Z. li, and W. Guifu, "Mid-infrared Absorption of Femtosecond Laser Microstructured Silicon Formed in Different Gas Ambient," in Conference on Lasers and Electro-Optics, OSA Technical Digest (Optica Publishing Group, 2020), paper JW2B.14.

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Abstract

We researched the mid-infrared absorption changes of micro-structured silicon prepared in SF6, N2, and NF3, the different changes mainly due to the concentrations of impurities doped in surface layer.

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