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Conferences > CLEO_SI > 2020 > JTu2B > JTu2B.13

Tuning the Optical Signature of Few-Layer M0S2 on Silicon Substrate using Mechanical Nano-Stamping Approach

Ghada Dushaq, Pawan Mishra, and Mahmoud Rasras

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Abstract

Spatially modulated biaxial tensile strain in a few-layers M0S2 on pre-patterned Si substrate is demonstrated. Using depth-controlled nanoindentation, localized strain on Si is achieved. Results are verified by observing shifts in the MoS2’s bandgap and phonon modes.

© 2020 The Author(s)

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