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Conferences > CLEO_SI > 2019 > SM3H > SM3H.2

Single-Shot Few-Cycle Pulse Laser-induced Damage and Ablation of HfO2/SiO2-based Optical Thin Films

Noah Talisa, Michael Tripepi, Brandon Harris, Abdallah AlShafey, Aaron Davenport, Emmett Randel, Carmen S. Menoni, and Enam Chowdhury

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Abstract

Few-cycle pulse laser damage and ablation of HfO2/SiO2-based single-, double-, and quad-layer thin films are studied using time-resolved surface microscopy. Ablation of multilayer samples happens as fast as for the single-layer, indicating a “blow-out” mechanism.

© 2019 The Author(s)

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