Four-Wave Mixing in a Multi-Layer SiNx/a-Si:H Photonic Chip

Michael Kossey; Kangmei Li; Hongcheng Sun; Amy C. Foster

doi:10.1364/CLEO_SI.2018.STh3I.5

Conference on Lasers and Electro-Optics
OSA Technical Digest (online) (Optica Publishing Group, 2018),
paper STh3I.5
•https://doi.org/10.1364/CLEO_SI.2018.STh3I.5

Four-Wave Mixing in a Multi-Layer SiN_x/a-Si:H Photonic Chip

Michael Kossey, Kangmei Li, Hongcheng Sun, and Amy C. Foster

CLEO: Science and Innovations 2018

San Jose, California United States
13–18 May 2018
ISBN: 978-1-943580-42-2

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Integrated Photonic Platforms (STh3I)

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M. Kossey, K. Li, H. Sun, and A. C. Foster, "Four-Wave Mixing in a Multi-Layer SiNx/a-Si:H Photonic Chip," in Conference on Lasers and Electro-Optics, OSA Technical Digest (online) (Optica Publishing Group, 2018), paper STh3I.5.

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Abstract

We demonstrate four-wave mixing (FWM) in a-Si:H waveguides in a multi-layer integrated photonic chip. The a-Si:H waveguides are accessed through interlayer couplers from waveguides composed of SiN_x and exhibit 0.45±0.05 dB loss per transition.

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