Abstract
We demonstrate multispectral metasurfaces over wafer-scale areas exhibiting greater than 85 percent absorption, ~100 nm linewidths from 580–1125 nm by patterning plasmonic resonators in micron-scale pixels using a fusion of bottom-up and top-down fabrication techniques.
© 2017 Optical Society of America
PDF ArticleMore Like This
D. Panna, S. Bouscher, S. Cohen, L. Rybak, D. Ritter, and A. Hayat
EA_11_6 European Quantum Electronics Conference (EQEC) 2017
Andrew M. Boyce, Jon W. Stewart, Virginia Wheeler, and Maiken H. Mikkelsen
FM2H.7 CLEO: QELS_Fundamental Science (CLEO:FS) 2017
Laurent Boulley, Thomas Maroutian, Pierre Laffaille, Raffaele Colombelli, Lianhe Li, Edmund Linfield, and Adel Bousseksou
MM3C.2 Mid-Infrared Coherent Sources (MICS) 2018