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Multispectral Metasurface Absorbers for Optoelectronic Devices

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Abstract

We demonstrate multispectral metasurfaces over wafer-scale areas exhibiting greater than 85 percent absorption, ~100 nm linewidths from 580–1125 nm by patterning plasmonic resonators in micron-scale pixels using a fusion of bottom-up and top-down fabrication techniques.

© 2017 Optical Society of America

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