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Conferences > CLEO_SI > 2016 > STh3Q > STh3Q.2

Enhanced absorption and plasmon excitation in the bulk of fused silica with femtosecond Bessel beams

C. Xie, R. Giust, J. Zhang, V. Jukna, R. Meyer, L. Furfaro, M. Jacquot, L. Froehly, J. M. Dudley, A. Couairon, and F. Courvoisier

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Abstract

We image femtosecond Bessel beam propagation in fused silica under ablation conditions, and observe unexpectedly high absorption. We identify plasmon excitation and plasma channel field enhancement as the likely mechanism for this increased absorption.

© 2016 Optical Society of America

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