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Conferences > CLEO_SI > 2016 > SF2P > SF2P.6

Engineering of a Second-Order Nonlinearity in Silicon-Dielectric Multilayers

Hung-Hsi Lin, Mu-Han Yang, Rajat Sharma, Matthew W. Puckett, Sergio Montoya, Christian D. Wurm, Felipe Vallini, Eric E. Fullerton, and Yeshaiahu Fainman

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Abstract

We demonstrate a way to engineer a second-order nonlinearity (χ(2)) in silicon-dielectric multilayers via the electric-field induced second-harmonic effect. The value of χ(2) measured using the Maker fringe method is 1.2 pm/V.

© 2016 Optical Society of America

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