Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > CLEO_SI > 2015 > STh3M > STh3M.6

Super-resolution Optical Nanolithography: Beyond the far-field diffraction limit

Apratim Majumder, Farhana Masid, Benjamin Pollock, Trisha L. Andrew, and Rajesh Menon

Not Accessible

Your library or personal account may give you access

Abstract

We report on overcoming the far-field diffraction limit using an approach that we call Absorbance Modulation Optical Lithography (AMOL).

© 2015 Optical Society of America

PDF Article
More Like This
Super-Resolution Optical Lithography via Barrier-Free Absorbance Modulation and Separable Substrate Technique

Apratim Majumder, Farhana Masid, Benjamin Pollock, Trisha L. Andrew, and Rajesh Menon
JW2A.3 Adaptive Optics: Analysis, Methods & Systems (AO) 2015

Circumventing the far-field diffraction limit in optical nanopatterning

Rajesh Menon
ITu2E.1 Imaging Systems and Applications (IS) 2013

Optical “Hyperlens”: imaging in the far field beyond the diffraction limit

Zubin Jacob, Leonid V. Alekseyev, and Evgenii Narimanov
QTuD3 Quantum Electronics and Laser Science Conference (CLEO:FS) 2007

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use