Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

1.3 μm InAs/GaAs Quantum Dot Lasers on SOI Waveguide Structures

Not Accessible

Your library or personal account may give you access

Abstract

A 1.3-μm InAs/GaAs quantum dot laser on a silicon-on-insulator waveguide structure with a threshold current density of 300 A/cm2 and lasing temperatures greater than 100°C is fabricated by direct wafer bonding and layer transfer.

© 2014 Optical Society of America

PDF Article
More Like This
1.3 μm InAs/GaAs Quantum Dot Lasers on Si Substrates with Current Injection across Direct-Bonded GaAs/Si Heterointerfaces

Katsuaki Tanabe, Katsuyuki Watanabe, Stephane Faure, and Yasuhiko Arakawa
Tu.6.LeSaleve.1 European Conference and Exposition on Optical Communications (ECOC) 2011

1.3 µm InAs/GaAs Quantum Dot Lasers on Si Rib Structures with Current Injection across Direct-Bonded GaAs/Si Heterointerfaces

Katsuaki Tanabe, Katsuyuki Watanabe, and Yasuhiko Arakawa
P2.15 European Conference and Exhibition on Optical Communication (ECOC) 2012

1.3-μm InAs/GaAs Quantum Dot Lasers on Silicon-on-Insulator Substrates by Metal-Stripe Bonding

Yuan-Hsuan Jhang, Katsuaki Tanabe, Satoshi Iwamoto, and Yasuhiko Arakawa
SW3F.4 CLEO: Science and Innovations (CLEO:S&I) 2015

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.