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Plasma Density Measurement Using a Dispersion Interferometer Based on Second-Harmonic Generation in Orientation-Patterned GaAs

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Abstract

A dispersion interferometer based on second-harmonic generation in orientation-patterned GaAs has been used to measure the line density of electrons in a radio-frequency plasma with a detection limit of 7 × 1016 m−2.

© 2013 Optical Society of America

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