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Conferences > CLEO_SI > 2012 > CF2A > CF2A.5

High quality factor and high confinement silicon resonators using etchless process

Austin Griffith, Jaime Cardenas, Carl B. Poitras, and Michal Lipson

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Abstract

We demonstrate high-Q factor and high confinement silicon ring resonators fabricated by a local oxidation of silicon (LOCOS) process. We achieve an intrinsic quality factor of 525,000 in 410 μm-circumference ring resonator.

© 2012 Optical Society of America

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