Nano-scale Strain Mapping using Near-field Spectroscopy

A. Llopis; S.M.S. Pereira; I.M. Watson; A.A. Krokhin; A. Neogi

doi:10.1364/CLEO_SI.2011.CMV6

CLEO:2011 - Laser Applications to Photonic Applications
OSA Technical Digest (CD) (Optica Publishing Group, 2011),
paper CMV6
•https://doi.org/10.1364/CLEO_SI.2011.CMV6

Nano-scale Strain Mapping using Near-field Spectroscopy

A. Llopis, S.M.S. Pereira, I.M. Watson, A.A. Krokhin, and A. Neogi

CLEO: Science and Innovations 2011

Baltimore, Maryland United States
1–6 May 2011
ISBN: 978-1-55752-910-7

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Fabrication and Characterization of Nano Plasmonic Devices (CMV)

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A. Llopis, S. M. S. Pereira, I. M. Watson, A. A. Krokhin, and A. Neogi, "Nano-scale Strain Mapping using Near-field Spectroscopy," in CLEO:2011 - Laser Applications to Photonic Applications, OSA Technical Digest (CD) (Optica Publishing Group, 2011), paper CMV6.

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Abstract

A technique is presented for mapping the strain in light emitting nano- and hetero- structures using near- field spectroscopy. This technique makes use of theoretical calculations to extract the strain from near-field data.

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