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Conferences > CLEO_QELS > 2016 > FW4A > FW4A.4

Effective Third-Order Nonlinearities in Refractory Plasmonic TiN Thin Films

Nathaniel Kinsey, Akbar Ali Syed, Devon Courtwright, Clayton DeVault, Carl E. Bonner, Vladimir I. Gavrilenko, Vladimir M. Shalaev, David J. Hagan, Eric W. Van Stryland, and Alexandra Boltasseva

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Abstract

Here we study the third-order susceptibility of TiN thin films using the dual-arm Z-scan technique at 780 nm and 1550 nm. Due to its refractory nature, TiN is a promising metallic nonlinear component.

© 2016 Optical Society of America

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