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Conferences > CLEO_QELS > 2014 > JTh2A > JTh2A.96

Reflective plasmonic imaging lithography with deep sub-wavelength resolution and high aspect ratio

Changtao Wang, Ping Gao, Zeyu Zhao, Na Yao, Qinyan Wang, and Xiangang Luo

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Abstract

Reflective silver layer is employed toimproveboth resolution andfidelity of sub-diffraction lithography by amplifying evanescent waves and tailoring electric field components. Nano characters patterns with depth ~35nm and about 36nm line width are obtained.

© 2014 Optical Society of America

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