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Nanolithography based on Two-Surface-Plasmon-Polariton-Absorption

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Abstract

Nanolithography utilizing the nonlinear absorption of two surface plasmon polaritons in resists has been demonstrated. The linewidth of ~λ0/11 are achieved by illuminating the plasmonic mask with the femtosecond laser, which is potential for future nanofabrication.

© 2013 Optical Society of America

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