Metrology Sources for EUV Lithography

Steve Home; Paul Blackborow; Matthew M. Bensen; Matthew J. Partlow; Deborah Gustafson; Michael Goldstein

doi:10.1364/CLEO_AT.2013.JW1D.3

CLEO: 2013
OSA Technical Digest (online) (Optica Publishing Group, 2013),
paper JW1D.3
•https://doi.org/10.1364/CLEO_AT.2013.JW1D.3

Metrology Sources for EUV Lithography

Steve Home, Paul Blackborow, Matthew M. Bensen, Matthew J. Partlow, Deborah Gustafson, and Michael Goldstein

CLEO: QELS_Fundamental Science 2013

San Jose, California United States
9–14 June 2013
ISBN: 978-1-55752-972-5

From the session
Advances in Extreme UV Science and Applications II (JW1D)

Open Access

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S. Home, P. Blackborow, M. M. Bensen, M. J. Partlow, D. Gustafson, and M. Goldstein, "Metrology Sources for EUV Lithography," in CLEO: 2013, OSA Technical Digest (online) (Optica Publishing Group, 2013), paper JW1D.3.

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Abstract

Mask inspection and validation are key elements of the EUV lithography infrastructure. Requirements for the light sources to enable these tools will be introduced, and one source described in detail. As the field develops, enhanced sources will be required; two will be described. Article not available.

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