Abstract

Compared to the lithographic realization of nano-structures for microelectronics the demands of today’s optical applications on the lithographic fabrication technologies are different. This relates to the lateral shape of the structures as well as to their three dimensional surface profile and, last but not least, the substrates on which the structure need to be realized. On the other hand, optical nano-structures are often periodic which allows for the use of dedicated lithographic exposure principles not always applicable for the structuring of IC pattern.

© 2017 IEEE